Vistec Semiconductor (previously Leica Microsystems, Semiconductor Equipment Division) will launch their new corporate identity – including a new name and new design – at the Semicon Europe show. The name change is a result of the acquisition of the Leica Microsystems semiconductor equipment division by Golden Gate Capital (San Francisco, CA) in September 2005.
Vistec Semiconductor’s innovative product portfolio includes inspection and review systems for the process control of wafers, mask metrology systems, and electron beam lithography systems. These are used for production of microchips, in integrated optics and scientific and industrial research. The new Vistec Semiconductor logo symbolizes both core competencies: a wafer for inspection and the line under the name as the electron beam.
“The new name, a combination of ‘visionary’ and ‘technologies,’ underlines the company goals: development of new – and future-oriented – technologies,” explains Papken Der Torossian, Chairman of Vistec Semiconductor Systems.
With over 30 years of semiconductor industry experience, the company’s know-how is the foundation for constant innovation. State-of-the-art production facilities and constant product development enable success in emerging technologies and the dynamic chip technology market. Papken Der Torossian is confident; “We will continue our positive revenue growth under the new name and further strengthen our market positions in optical inspection and review, mask metrology and electron beam lithography systems.”
Vistec Semiconductor consists of three divisions that feature leading technology used by the world’s major semiconductor manufacturers and research institutes. With over 500 employees around the world, the company has production facilities in Germany and the UK, and a distribution and service network in the USA, Japan, China, Singapore, Taiwan and Korea.
Vistec Semiconductor’s innovative product portfolio includes inspection and review systems for the process control of wafers, mask metrology systems, and electron beam lithography systems. These are used for production of microchips, in integrated optics and scientific and industrial research. The new Vistec Semiconductor logo symbolizes both core competencies: a wafer for inspection and the line under the name as the electron beam.
“The new name, a combination of ‘visionary’ and ‘technologies,’ underlines the company goals: development of new – and future-oriented – technologies,” explains Papken Der Torossian, Chairman of Vistec Semiconductor Systems.
With over 30 years of semiconductor industry experience, the company’s know-how is the foundation for constant innovation. State-of-the-art production facilities and constant product development enable success in emerging technologies and the dynamic chip technology market. Papken Der Torossian is confident; “We will continue our positive revenue growth under the new name and further strengthen our market positions in optical inspection and review, mask metrology and electron beam lithography systems.”
Vistec Semiconductor consists of three divisions that feature leading technology used by the world’s major semiconductor manufacturers and research institutes. With over 500 employees around the world, the company has production facilities in Germany and the UK, and a distribution and service network in the USA, Japan, China, Singapore, Taiwan and Korea.
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